Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2019 | High- K Gate Dielectrics Treated with in Situ Atomic Layer Bombardment | Chang T.-J; Lee W.-H; Wang C.-I; Yi S.-H; Yin Y.-T; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | ACS Applied Electronic Materials | 19 | 19 |