公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2004 | Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition | Chen, H.L.; Lee, H.F.; Chao, W.C.; Hsieh, C.I.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2008 | Fabrication of autocloned photonic crystals using electron-beam guns with ion-assisted deposition | Chang, T.-H.; Chen, S.-H.; Lee, C.-C.; Chen, H.-L.; HSUEN-LI CHEN | Thin Solid Films | | | |
2007 | Fabrication of gold-nanoparticle-infiltrated inverse opal structures with both photonic bandgap and surface plasmon resonance characteristics | Chen, H.L.; Lin, Y.H.; Chuang, S.Y.; Wan, D.H.; Lin, C.H.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC | | | |
2006 | Fabrication of nanoscale PtO<inf>x</inf>/PZT/PtO<inf>x</inf> capacitors by e-beam lithography and plasma etching with photoresist mask | Huang, C.-K.; Chen, Y.-H.; Liang, Y.-C.; Wu, T.-B.; Chen, H.-L.; Chao, W.-C.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2006 | Fabrication of Nanoscale PtOx/PZT/PtOx Capacitors by E-beam Lithography and Plasma Etching with Photoresist Mask | Huang, Chun-Kai; Chen, Yen-Hua; Liang, Yuan-Chang; Wu, Tai-Bor; Chen, Hsuen-Li ; Chao, Wen-Chi | Electrochemical and Solid State Letter | | | |
2005 | Fabrication of Silicon and Germanium Nanostructures by Combination of Hydrogen Plasma Dry Etching and VLS Mechanism | Yang, Ming-Che; Shieh, Jiann; Ko, Tsung-Shine; Chen, Hsuen-Li ; Chu, Tieh-Chi | Japanese Journal of Applied Physics | 2 | | |
2004 | Fabrication of sub-60-nm contact holes in silicon dioxide layers | Ko, F.-H.; You, H.-C.; Chu, T.-C.; Lei, T.-F.; Hsu, C.-C.; Chen, H.-L.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2007 | Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography | Chen, H.L.; Huang, K.T.; Lin, C.H.; Wang, W.Y.; Fan, W.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2006 | Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography | Chen, H.L.; Fan, W.; Cheng, C.C.; Lin, C.H.; Huang, K.T.; HSUEN-LI CHEN | Journal of the Electrochemical Society | | | |
2001 | A Fabry-Perot type anti-reflective coating for deep ultraviolet binary photomask application | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F <inf>2</inf> excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2002 | Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask applications | Chen, H.-L.; Chu, T.-C.; Hsu, C.-K.; Ko, F.-H.; Huang, T.-Y.; HSUEN-LI CHEN | Applied Optics | | | |
2003 | Far-Infrared Absorption of Split Ring Resonators: negative permeability at infrared region | Hsu, A. C.; Cheng, Y. K.; Chen, K. H.; Chern, J. L.; Wu, S. C.; HSUEN-LI CHEN ; Chiao, W. C.; ALISON H CHANG; Liean, C. C.; Shy, J. T. | Optics InfoBase Conference Papers | 0 | | |
2016 | Filter-free, junctionless structures for color sensing | Lin, K.-T.; Chen, H.-L.; Lai, Y.-S.; HSUEN-LI CHEN | Nanoscale | | | |
2019 | Fluorescent microdiamonds conjugated with hollow gold nanoparticles as photothermal fiducial markers in tissue | Kuo, S.-J.; Chang, S.-W.; Hui, Y.Y.; Chen, O.Y.; Chen, Y.-W.; Lin, C.-C.; Wan, D.; Chen, H.-L.; Chang, H.-C.; HSUEN-LI CHEN | Journal of Materials Chemistry C | | | |
1999 | Formation of Si nanoclusters in amorphous silicon thin films by excimer laser annealing | Yeh, Jiun-Lin; Chen, Hsuen-Li ; Shih, An; Lee, Si-Chen | Electronics Letters | 1 | 1 | |
2021 | Gallium Arsenide-Based Active Antennas for Optical Communication Photodetection with Robustness to Voltage and Temperature | Lin C.-C; Chang B.-J; Chen S.-H; Lin K.-T; Chang S.-W; Chen W.-Y; Chen B.-Y; Liu M.-C; Chen H.-L.; HSUEN-LI CHEN | Advanced Optical Materials | | | |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | HSUEN-LI CHEN ; LON A. WANG | Applied Optics | 13 | 12 | |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | Chen, Hsuen-Li ; Wang, Lon A. | Applied Optics | 13 | 12 | |