公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
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2010 | Robust control design for vibration isolation of an electron beam projection lithography system | FU-CHENG WANG ; Hong, M.-F.; JIA-YUSH YEN ; Wang, Fu-Cheng; Hong, Min-Feng; Yen, Jia-Yush | Japanese Journal of Applied Physics | 6 |