公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2002 | Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2006 | Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure | Chen, H.L.; Chuang, S.Y.; Cheng, H.C.; Lin, C.H.; Chu, T.C. | Microelectronic Engineering | | | |
2006 | Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure | Chen, H.L.; Chuang, S.Y.; Cheng, H.C.; Lin, C.H.; Chu, T.C.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2003 | Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings | Cheng, H.C.; Chen, H.L.; Ko, T.S.; Lai, L.J.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2001 | Low dielectric constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2001 | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2001 | Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography | Chen, H.L.; Chu, T.C.; Li, M.Y.; Ko, F.H.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2002 | Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Solid-State Electronics | | | |
2005 | Minimum-Cost Multicast Routing for Multi-Layered Multimedia Distribution | Lin, F.Y.S.; Cheng, H.C.; Yeh, J.Y. | | | | |
2004 | Nanoparticle-assisted growth of porous germanium thin films | Shieh, J.; Chen, H.L.; Ko, T.S.; Cheng, H.C.; Chu, T.C.; HSUEN-LI CHEN | Advanced Materials | | | |
2007 | Tunable organic solid-state DFB laser utilizing molecular reorientation | CHIEH-HSIUNG KUAN ; KEN-TSUNG WONG ; Wu, Chung Chih ; Cheng, H.C.; Lin, H.W.; Wu, C.C.; Wong, K.T.; CHIEH-HSIUNG KUAN ; KEN-TSUNG WONG | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2005 | Tuning photonic bandgap of 3D opal structures by utilizing polymer and silica hybrid colloids | Lin, Y.C.; Chen, H.L.; Hsu, T.K.; Lin, C.H.; Hsieh, K.C.; Cheng, H.C. | Microprocesses and Nanotechnology Conference, 2005 International | | | |