| Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
| 2009 | A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 53th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2009 | | | |
| 2008 | A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI | Lithography Asia 2008 - Proc. SPIE | 5 | 0 | |
| 2010 | Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography | Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 2009 | Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Lithography Asia 2009 | | | |
| 2010 | Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography | Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science and Technology B | 1 | 5 | |
| 2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | The 55th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication | 1 | 5 | |
| 2013 | Method and Apparatus for Designing Patterning System Based on Patterning Fidelity | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | | | | |
| 2014 | Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | | | | |
| 2012 | New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints | Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 5 | |
| 2012 | New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 8 | |
| 2009 | Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2009 | | | |
| 2008 | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | | | |
