公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
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2010 | Robust control design for vibration isolation of an electron beam projection lithography system | Wang, F.-C.; Hong, M.-F.; Yen, J.-Y.; Wang, Fu-Cheng; Hong, Min-Feng; Yen, Jia-Yush; FU-CHENG WANG ; JIA-YUSH YEN | Japanese Journal of Applied Physics | 6 |