公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2010 | Architecture for next generation massively parallel maskless lithography system (MPML2) | Su, M.-S.; Tsai, K.-Y.; Lu, Y.-C.; Kuo, Y.-H.; Pei, T.-H.; Yen, J.-Y.; YI-CHANG LU ; KUEN-YU TSAI ; JIA-YUSH YEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2015 | Comparison of the vectorial diffraction theory and Fraunhofer approximation method on diffractive images of Fresnel zone plates | Pei, T.-H.; KUEN-YU TSAI ; JIA-HAN LI | Optical and Quantum Electronics | 0 | 0 | |
2010 | Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method | Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 3 | |
2014 | The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions | Pei, T.-H.; Tsai, K.-Y.; JIA-HAN LI ; KUEN-YU TSAI | Advanced Materials Research | 0 | 0 | |
2010 | Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors | Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; KUEN-YU TSAI ; JIA-HAN LI | Japanese Journal of Applied Physics | 2 | 2 | |
2009 | Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography | CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN ; KUEN-YU TSAI ; JIA-YUSH YEN ; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2014 | Simulation and experiment of speckle reduction by the beam splitting method on a pico-projection system | Pei, T.-H.; Yeh, F.-C.; Tsai, K.-Y.; Li, J.-H.; Liu, Z.-R.; Hung, C.-L.; JIA-HAN LI | Advanced Materials Research | | | |