| Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2009 | A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows | Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; KUEN-YU TSAI ; JIA-HAN LI | Lithography Asia 2009 - Proc. SPIE | 3 | 0 | |
| 2010 | Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | |||
| 2010 | Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography | Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | |||
| 2009 | Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | |||
| 2009 | Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method | Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; KUEN-YU TSAI ; JIA-HAN LI | Lithography Asia 2009, Proc. SPIE | 0 | 0 |
