公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
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2020 | Alkaline-developable and negative-type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo-base generator | Tseng, Ling-Ya; Lin, Yan-Cheng; Kuo, Chih-Cheng; Chen, Chun-Kai; Wang, Chuan-En; Kuo, Chi-Ching; Ueda, Mitsuru; WEN-CHANG CHEN | JOURNAL OF POLYMER SCIENCE |