https://scholars.lib.ntu.edu.tw/handle/123456789/151972| Title: | Electrical and optical reliability improvement of HfO2 gate dielectric by deuterium and hydrogen incorporation | Authors: | Yu, C.-Y. Chen, T.C. Lee, M.H. Huang, S.-H. Lee, L.S. Liu, C.W. |
Issue Date: | Jul-2004 | Start page/Pages: | - | Source: | Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/2007041910042837 | ISSN: | N/A | Other Identifiers: | N/A |
| Appears in Collections: | 電機工程學系 |
| File | Description | Size | Format | |
|---|---|---|---|---|
| 01345578.pdf | 219.43 kB | Adobe PDF | View/Open |
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