https://scholars.lib.ntu.edu.tw/handle/123456789/297465
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Y.-L. | en_US |
dc.contributor.author | Liu, C.-S. | en_US |
dc.contributor.author | Chi, Y. | en_US |
dc.contributor.author | Carty, A.J. | en_US |
dc.contributor.author | Peng, S.-M. | en_US |
dc.contributor.author | Lee, G.-H. | en_US |
dc.contributor.author | SHIE-MING PENG | zz |
dc.creator | Chen, Y.-L.;Liu, C.-S.;Chi, Y.;Carty, A.J.;Peng, S.-M.;Lee, G.-H. | - |
dc.date.accessioned | 2018-09-10T04:10:24Z | - |
dc.date.available | 2018-09-10T04:10:24Z | - |
dc.date.issued | 2002 | - |
dc.identifier.uri | http://www.scopus.com/inward/record.url?eid=2-s2.0-0002451171&partnerID=MN8TOARS | - |
dc.identifier.uri | http://scholars.lib.ntu.edu.tw/handle/123456789/297465 | - |
dc.language | en | en |
dc.relation.ispartof | Chemical Vapor Deposition | en_US |
dc.source | AH | - |
dc.title | Deposition of iridium thin films using new IrI CVD precursors | - |
dc.type | journal article | en |
dc.identifier.doi | 10.1002/1521-3862(20020116)8:1<17 | - |
dc.identifier.scopus | 2-s2.0-0002451171 | - |
dc.relation.pages | 17-20 | - |
dc.relation.journalvolume | 8 | - |
dc.relation.journalissue | 1 | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | journal article | - |
item.grantfulltext | none | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
crisitem.author.dept | Chemistry | - |
crisitem.author.orcid | 0000-0003-1412-5018 | - |
crisitem.author.parentorg | College of Science | - |
顯示於: | 化學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。