https://scholars.lib.ntu.edu.tw/handle/123456789/309376| Title: | Electrical and optical reliability improvement of HfO<inf>2</inf> gate dielectric by deuterium and hydrogen incorporation | Authors: | Yu, C.-Y. Chen, T.C. Lee, M.H. Huang, S.-H. Lee, L.S. Liu, C.W. CHEE-WEE LIU |
Issue Date: | 2004 | Start page/Pages: | 165-168 | Source: | International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-14844297748&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/309376 |
| Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
