https://scholars.lib.ntu.edu.tw/handle/123456789/338633
標題: | Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation | 作者: | Yeh, Kuo-Lang Jeng, Ming-Jer Hwu, Jenn-Gwo JENN-GWO HWU |
公開日期: | 1998 | 卷: | 22 | 期: | 4 | 起(迄)頁: | 539-545 | 來源出版物: | Proceedings of the National Science Council, Republic of China, Part A: Physical Science and Engineering | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0032115466&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/338633 |
顯示於: | 電機工程學系 |
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