https://scholars.lib.ntu.edu.tw/handle/123456789/348055| Title: | Chemical mechanical polishing of low-dielectric-constant polymers: hydrogen silsesquioxane and methyl silsesquioxane | Authors: | Chen, W.-C. Lin, S.-C. Dai, B.-T. Tsai, M.-S. WEN-CHANG CHEN |
Issue Date: | 1999 | Journal Volume: | 146 | Journal Issue: | 8 | Start page/Pages: | 3004-3008 | Source: | Journal of the Electrochemical Society | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0032592416&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/348055 |
DOI: | 10.1149/1.1392043 |
| Appears in Collections: | 化學工程學系 |
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