https://scholars.lib.ntu.edu.tw/handle/123456789/352126
標題: | A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows | 作者: | Philip C. W. Ng Kuen-Yu Tsai Yen-Min Lee Ting-Han Pei Fu-Min Wang Jia-Han Li KUEN-YU TSAI JIA-HAN LI |
公開日期: | 十一月-2009 | 起(迄)頁: | 75200S | 來源出版物: | Lithography Asia 2009 - Proc. SPIE | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/352126 | DOI: | 10.1117/12.837077 |
顯示於: | 電機工程學系 |
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