https://scholars.lib.ntu.edu.tw/handle/123456789/404514
Title: | Physical thickness 1.x nm ferroelectric HfZrOx negative capacitance FETs | Authors: | Lee, M.H. Fan, S.-T. Tang, C.-H. Chen, P.-G. Chou, Y.-C. Chen, H.-H. Kuo, J.-Y. Xie, M.-J. Liu, S.-N. Liao, M.-H. Jong, C.-A. Li, K.-S. Chen, M.-C. Liu, C.W. |
Issue Date: | 2017 | Start page/Pages: | 1327-1330 | Source: | International Electron Devices Meeting | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/404514 | DOI: | 10.1109/IEDM.2016.7838400 |
Appears in Collections: | 電機工程學系 |
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