https://scholars.lib.ntu.edu.tw/handle/123456789/432528
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | He J.L. | en_US |
dc.contributor.author | Won K.W. | en_US |
dc.contributor.author | Chang C.T. | en_US |
dc.contributor.author | Chen K.C. | en_US |
dc.contributor.author | Lin H.C. | en_US |
dc.contributor.author | HSIN-CHIH LIN | en_US |
dc.creator | HSIN-CHIH LIN;Lin H.C.;Chen K.C.;Chang C.T.;Won K.W.;He J.L. | - |
dc.date.accessioned | 2019-11-27T01:35:28Z | - |
dc.date.available | 2019-11-27T01:35:28Z | - |
dc.date.issued | 1999 | - |
dc.identifier.issn | 00431648 | - |
dc.identifier.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033368172&doi=10.1016%2fS0043-1648%2899%2900202-1&partnerID=40&md5=26ef1748dbcb62ca8ce72a43fad464c4 | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/432528 | - |
dc.publisher | Elsevier Sequoia SA, Lausanne, Switzerland | - |
dc.relation.ispartof | Wear | - |
dc.title | Cavitation-resistant TiNi films deposited by using cathodic arc plasma ion plating | en_US |
dc.type | conference paper | en |
dc.identifier.doi | 10.1016/S0043-1648(99)00202-1 | - |
dc.identifier.scopus | 2-s2.0-0033368172 | - |
dc.relation.pages | 104-110 | - |
dc.relation.journalvolume | 233-235 | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_5794 | - |
item.openairetype | conference paper | - |
item.grantfulltext | none | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.parentorg | College of Engineering | - |
顯示於: | 材料科學與工程學系 |
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