https://scholars.lib.ntu.edu.tw/handle/123456789/447967| Title: | Improved Si<inf>0.5</inf>Ge<inf>0.5</inf>/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopy | Authors: | Liao, M.-H. Chen, C.-H. MING-HAN LIAO |
Issue Date: | 2013 | Journal Volume: | 3 | Journal Issue: | 4 | Source: | AIP Advances | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/447967 | DOI: | 10.1063/1.4801933 |
| Appears in Collections: | 機械工程學系 |
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