https://scholars.lib.ntu.edu.tw/handle/123456789/447976| Title: | Strain engineering of nanoscale Si MOS devices | Authors: | Huang, J. Chang, S.-T. Hsieh, B.-F. Liao, M.-H. Wang, W.-C. Lee, C.-C. MING-HAN LIAO |
Issue Date: | 2010 | Journal Volume: | 518 | Journal Issue: | 6 SUPPL. 1 | Source: | Thin Solid Films | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/447976 | DOI: | 10.1016/j.tsf.2009.10.098 |
| Appears in Collections: | 機械工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.