https://scholars.lib.ntu.edu.tw/handle/123456789/491366
Title: | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Authors: | Chen, H.L. Lee, C.C. Chuang, Y.F. Liu, M.C. Hsieh, C.I. Ko, F.H. HSUEN-LI CHEN |
Issue Date: | 2003 | Journal Volume: | 6 | Journal Issue: | 4 | Source: | Electrochemical and Solid-State Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491366 | DOI: | 10.1149/1.1560001 |
Appears in Collections: | 材料科學與工程學系 |
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