https://scholars.lib.ntu.edu.tw/handle/123456789/491382
標題: | Mechanism and modeling of ring pattern formation for electron beam exposure on zwitterresist | 作者: | Chen, J.-K. Ko, F.-H. Chang, F.-C. Chen, H.-L. HSUEN-LI CHEN |
關鍵字: | Electron beam; Heating effect; Ring pattern; Throughput; Zwitterresist | 公開日期: | 2002 | 起(迄)頁: | 110-111 | 來源出版物: | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | 摘要: | The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 μC/cm2, while it could be neglected at less than 600 μC/cm2. Mathematical modeling for the prediction of ring width for zwitterresist was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491382 | ISSN: | 00214922 | DOI: | 10.1109/IMNC.2002.1178568 | SDG/關鍵字: | Electron beams; Electron scattering; Heating; Mathematical models; Sensitivity analysis; Throughput; Zwitterresists; Photoresists |
顯示於: | 材料科學與工程學系 |
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