https://scholars.lib.ntu.edu.tw/handle/123456789/491399
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, H.L. | en_US |
dc.contributor.author | Ko, F.H. | en_US |
dc.contributor.author | Chu, T.C. | en_US |
dc.contributor.author | Cheng, H.C. | en_US |
dc.contributor.author | Huang, T.Y. | en_US |
dc.contributor.author | HSUEN-LI CHEN | en_US |
dc.creator | HSUEN-LI CHEN;Huang, T.Y.;Cheng, H.C.;Chu, T.C.;Ko, F.H.;Chen, H.L. | - |
dc.date.accessioned | 2020-05-12T02:50:35Z | - |
dc.date.available | 2020-05-12T02:50:35Z | - |
dc.date.issued | 2001 | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/491399 | - |
dc.relation.ispartof | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | - |
dc.title | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | en_US |
dc.type | conference paper | en |
dc.identifier.doi | 10.1109/IMNC.2001.984124 | - |
dc.identifier.scopus | 2-s2.0-84960373085 | - |
dc.identifier.url | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960373085&doi=10.1109%2fIMNC.2001.984124&partnerID=40&md5=9c0b3222235fd0dcba4e8006cf53da48 | - |
dc.relation.pages | 132-133 | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_5794 | - |
item.openairetype | conference paper | - |
item.grantfulltext | none | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.orcid | 0000-0002-7569-572X | - |
crisitem.author.parentorg | College of Engineering | - |
顯示於: | 材料科學與工程學系 |
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