https://scholars.lib.ntu.edu.tw/handle/123456789/491405
標題: | Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies | 作者: | Lin, C.H. HSUEN-LI CHEN LON A. WANG |
公開日期: | 2000 | 卷: | 18 | 期: | 6 | 起(迄)頁: | 3323-3327 | 來源出版物: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 摘要: | The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034314807&doi=10.1116%2f1.1321273&partnerID=40&md5=2f00b6eb3572c153d48f98324ebc65f7 | DOI: | 10.1116/1.1321273 | SDG/關鍵字: | Antireflection coatings; Chemical vapor deposition; Electron cyclotron resonance; Mathematical models; Photolithography; Plasma etching; Thermal effects; Bottom antireflective coating (BARC); Hexamethyldisiloxane films; Semiconducting films |
顯示於: | 材料科學與工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。