https://scholars.lib.ntu.edu.tw/handle/123456789/491409
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, H. L. | en_US |
dc.contributor.author | L. A. Wang | en_US |
dc.contributor.author | LON A. WANG | en_US |
dc.contributor.author | HSUEN-LI CHEN | en_US |
dc.creator | HSUEN-LI CHEN;Chen, H. L. | - |
dc.date.accessioned | 2020-05-12T02:50:37Z | - |
dc.date.available | 2020-05-12T02:50:37Z | - |
dc.date.issued | 1998 | - |
dc.identifier.issn | 0734211X | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/491409 | - |
dc.relation.ispartof | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures | - |
dc.title | Characteristics of plasma enhanced chemical vapor deposition-grown SiN[sub x] films prepared for deep ultraviolet attenuated phase-shifting masks | en_US |
dc.type | journal article | en |
dc.identifier.doi | 10.1116/1.590314 | - |
dc.identifier.url | http://scitation.aip.org/content/avs/journal/jvstb/16/6/10.1116/1.590314 | - |
dc.relation.pages | 3612 | - |
dc.relation.journalvolume | 16 | - |
dc.relation.journalissue | 6 | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | journal article | - |
item.grantfulltext | none | - |
crisitem.author.dept | Photonics and Optoelectronics | - |
crisitem.author.dept | Electrical Engineering | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.orcid | 0000-0002-7569-572X | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Engineering | - |
顯示於: | 材料科學與工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。