https://scholars.lib.ntu.edu.tw/handle/123456789/491721
Title: | Suppression of short channel effects in FinFETs using crystalline ZrO<inf>2</inf> high-K/Al<inf>2</inf>O<inf>3</inf> buffer layer gate stack for low power device applications | Authors: | Tsai, M.-C. Wang, C.-I. Chen, Y.-C. Chen, Y.-J. Li, K.-S. Chen, M.-C. Chen, M.-J. MIIN-JANG CHEN |
Issue Date: | 2018 | Journal Volume: | 33 | Journal Issue: | 3 | Source: | Semiconductor Science and Technology | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491721 | DOI: | 10.1088/1361-6641/aaab01 |
Appears in Collections: | 材料科學與工程學系 |
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