https://scholars.lib.ntu.edu.tw/handle/123456789/506102
標題: | Direct writing of silicon gratings with highly coherent ultraviolet laser | 作者: | Chao, C.-Y. Chen, C.-Y. CHEE-WEE LIU Chang, Y. CHIH-CHUNG YANG |
公開日期: | 1997 | 卷: | 71 | 期: | 17 | 起(迄)頁: | 2442-2444 | 來源出版物: | Applied Physics Letters | 摘要: | Silicon gratings with periods from 180 to 550 nm were fabricated with a laser ablation technique in which the interference fringe from an intense and coherent ultraviolet laser at 266 nm directly melted silicon surface. The scanning electron microscopy and atomic force microscopy pictures showed that the corrugations were in quite good quality with the depth as large as 70 nm. The measurement of grating period dependence on temperature showed that rapid thermal annealing could release the thermal strains, which were built during the melting and cooling process in laser ablation, and make the grating period variation more regular. Also, with an air gap between the sample and prism surfaces, the fabricated gratings had weaker thermal strains and more regular temperature dependencies. All the measurement results of temperature dependence were consistent with theoretical predictions. © 1997 American Institute of Physics. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/506102 | ISSN: | 00036951 | DOI: | 10.1063/1.120447 | SDG/關鍵字: | Annealing; Atomic force microscopy; Cooling; Laser ablation; Melting; Prisms; Q switched lasers; Scanning electron microscopy; Semiconducting silicon; Strain; Surfaces; Air gap; Direct writing; Interference fringes; Periodical corrugation; Silicon gratings; Temperature dependence; Thermal annealing; Thermal strain; Ultraviolet lasers; Diffraction gratings |
顯示於: | 電機工程學系 |
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