https://scholars.lib.ntu.edu.tw/handle/123456789/575682| Title: | Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN | Authors: | A. Henning J. D. Bartl A. Zeidler S. Qian O. Bienek C.-M. Jiang C. Paulus B. Rieger M. Stutzmann I. D. Sharp CHANG-MING JIANG |
Issue Date: | 2021 | Start page/Pages: | 2101441 | Source: | Advanced Functional Materials | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/575682 | DOI: | 10.1002/adfm.202101441 |
| Appears in Collections: | 化學系 |
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