https://scholars.lib.ntu.edu.tw/handle/123456789/606968
標題: | RF Performance of Stacked Si Nanosheet nFETs | 作者: | Lin H.-C Chou T Chung C.-C Tsen C.-J Huang B.-W Liu C.W. CHEE-WEE LIU |
關鍵字: | 5G;6G;cut-off frequency;gate-all-around;maximum oscillation frequency;mm-wave;RF;stacked nanosheets (NSs);Electron mobility;FinFET;Nanosheets;Transconductance;Back end of lines;Equivalent oxide thickness;Gate length;Maximum oscillation frequency;Output conductance;RF performance;TCAD simulation;Transistor arrays;Silicon | 公開日期: | 2021 | 卷: | 68 | 期: | 10 | 起(迄)頁: | 5277-5283 | 來源出版物: | IEEE Transactions on Electron Devices | 摘要: | Stacked nanosheet nFETs considering a six-stack four-finger transistor array are studied and optimized by validated TCAD simulation. Stacked Si nanosheet (NS) nFETs have lower parasitics than nFinFETs in the same six-fin/stack four-finger transistor array layout. With the same electron mobility, back-end-of-line (BEOL), equivalent oxide thickness (EOT) of 1.4 nm, and gate length of 30 nm, the stacked Si NSs have 1.1× cut-off frequency (240 versus 215 GHz) and 1.15× maximum oscillation frequency (290 versus 251 GHz) when compared to FinFETs due to larger transconductance increase than capacitance increase and output conductance decrease. With the optimized EOT of 0.8 nm and gate length of 18 nm, the stacked Si NSs can achieve cut-off frequency of 340 GHz and maximum oscillation frequency of 370 GHz. Furthermore, considering the higher electron mobility on {100} surfaces of NSs than {110} sidewalls of FinFETs as suggested by the ID-VGS fitting, the cut-off frequency and maximum oscillation frequency of stacked Si NSs can reach 380 and 390 GHz, respectively. ? 2021 IEEE. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85114719225&doi=10.1109%2fTED.2021.3106287&partnerID=40&md5=01ad513b121364ab941b30b38fd8bf88 https://scholars.lib.ntu.edu.tw/handle/123456789/606968 |
ISSN: | 00189383 | DOI: | 10.1109/TED.2021.3106287 |
顯示於: | 電機工程學系 |
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