https://scholars.lib.ntu.edu.tw/handle/123456789/616452
標題: | Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target | 作者: | Lu T.R. Chen L.C. Chen K.H. Bhusari D.M. Chen T.M. Kuo C.T. LI-CHYONG CHEN |
關鍵字: | Bio-inorganic target;Carbon nitride;Ion beam sputtering;Mass spectrometry | 公開日期: | 1998 | 卷: | 332 | 期: | 1-2 | 起(迄)頁: | 74-79 | 來源出版物: | Thin Solid Films | 摘要: | In order to reduce the activation energy barrier for the formation of carbon nitride during ion beam sputtering, a novel bio-molecular target material, instead of the conventional graphite target, is successfully developed to deposit the crystalline carbon nitride films. The adenine target consists of a high N/C ratio as well as a 6-fold carbonitro-ring structure similar to that in the hypothetical C3N4. The mass spectrum of adenine indicates the existence of 11 main carbonitro-hydrogen containing species. Thus, the adenine target is anticipated to enhance the nucleation and growth of carbon nitride films by providing abundant carbonitro-hydrogen containing species as intermediate states. X-ray photoelectron spectrum analyses of these films indicated the presence of C and N in the films, with high nitrogen to carbon ratio at about 0.48. Both infrared and Raman spectroscopies confirm the chemical bonding between the carbon and nitrogen. X-ray and electron diffraction indicates the presence of crystalline carbon nitride in the film. © 1998 Elsevier Science S.A. All rights reserved. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032476279&doi=10.1016%2fS0040-6090%2898%2901024-4&partnerID=40&md5=f7c5f1d3e295c9c1fb900b4b3a40774b https://scholars.lib.ntu.edu.tw/handle/123456789/616452 |
ISSN: | 00406090 | DOI: | 10.1016/S0040-6090(98)01024-4 | SDG/關鍵字: | Activation energy;Carbon inorganic compounds;Ceramic coatings;Film growth;Ion beams;Ion bombardment;Mass spectrometry;Molecular structure;Nucleation;Sputter deposition;Targets;X ray photoelectron spectroscopy;Biomolecular targets;Carbon nitride;Ion beam sputtering;Protective coatings |
顯示於: | 凝態科學研究中心 |
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