DC 欄位 | 值 | 語言 |
dc.contributor.author | 陳文章 | zh_TW |
dc.creator | 陳文章 | - |
dc.date | 2001 | zh_TW |
dc.date.accessioned | 2006-07-25T09:37:48Z | - |
dc.date.accessioned | 2018-06-28T17:22:38Z | - |
dc.date.available | 2006-07-25T09:37:48Z | - |
dc.date.available | 2018-06-28T17:22:38Z | - |
dc.date.issued | 2001 | - |
dc.identifier | 892214E002047 | zh_TW |
dc.identifier.uri | http://ntur.lib.ntu.edu.tw//handle/246246/9257 | - |
dc.format | application/pdf | zh_TW |
dc.format.extent | 379862 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.language | zh-TW | zh_TW |
dc.language.iso | zh_TW | - |
dc.publisher | 臺北市:國立臺灣大學化學工程學系暨研究所 | zh_TW |
dc.rights | 國立臺灣大學化學工程學系暨研究所 | zh_TW |
dc.subject | 化學機械研磨 | zh_TW |
dc.subject | 低介電常數高分子 | zh_TW |
dc.subject | 研磨粉體 | zh_TW |
dc.subject | 界面活性劑 | zh_TW |
dc.title | 深次微米半導體化學機械研磨技術之研究─子計畫四:低介電常數高分子介電膜之化學機械研磨特性研究(2/2) | zh_TW |
dc.title | Studies on the chemical-mechanical polishing characterization of low dielectric constant polymers | en |
dc.type | report | en |
dc.identifier.uri.fulltext | http://ntur.lib.ntu.edu.tw/bitstream/246246/9257/1/892214E002047.pdf | - |
dc.coverage | 計畫年度:89
第二期;起迄日期:2000-08-01/2001-07-31 | zh_TW |
item.openairetype | report | - |
item.fulltext | with fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_93fc | - |
item.grantfulltext | open | - |
item.languageiso639-1 | zh_TW | - |
item.cerifentitytype | Publications | - |
crisitem.author.dept | Chemical Engineering | - |
crisitem.author.dept | Office of the President | - |
crisitem.author.orcid | 0000-0003-3170-7220 | - |
crisitem.author.parentorg | College of Engineering | - |
crisitem.author.parentorg | Administrative Unit | - |
顯示於: | 化學工程學系
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