https://scholars.lib.ntu.edu.tw/handle/123456789/70699
Title: | Additional Nitrogen Ion-Implantation Treatment in STI to Relax the Intrinsic Compressive Stress for n-MOSFETs | Authors: | Liao, M.-H. Chen, Chih Hua Chang, Li Cheng Yang, Chen Kao, Ssu Chieh Liao, M.-H. |
Issue Date: | 2012 | Start page/Pages: | 2033-2036 | Source: | IEEE Transactions on Electron Devices | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/243963 | DOI: | 10.1109/TED.2012.2198824 |
Appears in Collections: | 機械工程學系 |
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