https://scholars.lib.ntu.edu.tw/handle/123456789/74992
Title: | Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks | Authors: | Chen, H. L. Wang, L.A. Hsu, C.W. |
Issue Date: | 1998 | Journal Volume: | Vacuum | Journal Issue: | 6 | Start page/Pages: | 3612-3617 | Source: | The Journal of | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/95603 |
Appears in Collections: | 材料科學與工程學系 |
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