https://scholars.lib.ntu.edu.tw/handle/123456789/75002
標題: | Optical-Gradient Antireflective Coatings for 157-nm Optical Lithography Applications | 作者: | Chen, Hsuen-Li Fan, Wonder Wang, Tzyy-Jyann Ko, Fu-Hsiung Zhai, Run-Sheng Hsu, Chien-Kui Chuang, Tung-Jung |
公開日期: | 2004 | 卷: | 43 | 期: | 10 | 起(迄)頁: | 2141-2145 | 來源出版物: | Applied Optics | 摘要: | We demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optical constants of the silicon nitride film are also changed gradually. A reflectance of less than 1% for various highly reflective substrates with high thickness-controlled tolerance has been achieved. The optical-gradient film is also shown to have high thermal stability during the postexposure bake procedure. Results indicate that the optical-gradient-type BARC is suitable in both ArF and F2 excimer lasers for sub-70-nm lithography applications. © 2004 Optical Society of America. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/95613 https://www.scopus.com/inward/record.uri?eid=2-s2.0-1942519182&doi=10.1364%2fAO.43.002141&partnerID=40&md5=14c743912e047713a445e06c67d8543a |
ISSN: | 1559128X | SDG/關鍵字: | Excimer lasers; Optical coatings; Optical films; Oxygen; Photolithography; Plasmas; Reflection; Silicon nitride; Thermodynamic stability; Thin films; Optical constants; Optical gradient antireflective coatings; Silicon nitride film; Antireflection coatings |
顯示於: | 材料科學與工程學系 |
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