Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2006 | Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si <inf>1-x</inf>Ge<inf>x</inf>/Si nMOSFETs with HfO<inf>2</inf> gate dielectric | Yeo, C.C.; Cho, B.J.; Lee, M.H.; Liu, C.W.; Choi, K.J.; Lee, T.W.; CHEE-WEE LIU | Semiconductor Science and Technology |