公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2019 | Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning | Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI | Proceeding of SPIE, Optical Microlithography XXXII | 1 | 0 | |
2017 | Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) | Kuen-Yu Tsai*; Chun-Hung Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2017 | Method for calibrating a Manufacturing process model | Kuen-Yu Tsai*; Alek C. Chen; JIA-HAN LI | ||||
2017 | Method for Calibrating A Manufacturing Process Model | Kuen-Yu Tsai*; Alek C. Chen; Jia-Han Li (National Taiwan University/ASML Netherlands B.V.); KUEN-YU TSAI | ||||
2018 | Model-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | Advanced Lithography 2018 -- Proc. SPIE 10584 Novel Patterning Technologies 2018 | 5 | 0 | |
2021 | Precision fabrication of EUVL programmed defects with helium ion beam patterning | Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI ; KUEN-YU TSAI | J. of Micro/Nanopatterning, Materials, and Metrology | 1 | 1 | |
2016 | Process for Fabricating Integrated Circuit (積體電路的製程) | Kuen-Yu Tsai*; Min-Jang Chen; Samuel C. Pan (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2017 | Projection Patterning With Exposure Mask | Kuen-Yu Tsai*; Miin-Jang Chen; Si-Chen Lee (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2008 | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; JIA-HAN LI | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | |||
2018 | Simulation-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & applications (IWNEBD) |