公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2018 | Simulation-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & applications (IWNEBD) |