公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2016 | Enhancement of gate-bias and current stress stability of p-type SnO thin-film transistors with SiNx/HfO2 passivation layers | S.-M. Hsu; Y.-S. Li; M.-S. Tu; J.-C. He; I-C. Chiu; P.-G. Chen; M.-H. Lee; J.-Z. Chen; I-C. Cheng; I-CHUN CHENG | The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices | |||
2015 | Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films | Y.-H. Jiang; I-C. Chiu; P.-K. Kao; J.-C. He; Y.-H. Wu; Y.-J. Yang; C.-C. Hsu ; I-C. Cheng; JIAN-ZHANG CHEN | Applied Surface Science | 30 | 29 | |
2016 | N-Type operation of low-temperature SnOx thin-film transistors induced by SiOx capping layer assisted back-channel oxidation | Y.-A. Shih; C.-H. Tsai; Y.-S. Li; I-C. Chiu; I-C. Cheng; I-CHUN CHENG | Optics & Photonics Taiwan, International Conference 2016 |