公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2003 | A Tri-layer Film Design as Bottom Antireflective Coating for KrF, ArF and F2 Lithographies | W. C. Cheng; L. A. Wang; LON A. WANG | Micro- and Nano-Engineering | |||
2004 | Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies | W. C. Cheng; F. D. Lai; H. M. Huang; LON A. WANG | Microelectronic Engineering | 5 | 5 | |
2003 | Phase masks working in 157 nm wavelength fabricated by immersion interference photolithography | W. C. Cheng; L. A. Wang; LON A. WANG | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 2 | 2 | |
2002 | Printing 65nm Dense Lines by Using Phase Masks at 157nm Wavelength | L. A. Wang; W. C. Cheng; LON A. WANG | The Third International Symposium on 157 nm Lithography |