公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2015 | Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography | Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi; Yu-Tian Shen; KUEN-YU TSAI | Japanese Journal of Applied Physics | 0 | 0 | |
2008 | Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence | Su, Y.-S.; Ng, P.C.W.; Tsai, K.-Y.; YUNG-YAW CHEN ; KUEN-YU TSAI | Proceedings of SPIE - The International Society for Optical Engineering | 15 | 0 | |
2008 | Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence | Su, Yi-Sheng; Ng, Philip C. W.; Tsai, Kuen-Yu ; Chen, Yung-Yaw | Proceedings of SPIE | 15 | | |
2002 | Design of Feedforward and Feedback Controllers by Signal Processing and Convex Optimization Techniques | Kuen-Yu Tsai; KUEN-YU TSAI | | | | |
2004 | Design of feedforward filters for improving tracking performances of existing feedback control systems | Kuen-Yu Tsai; Charles D. Schaper; Thomas Kailath; KUEN-YU TSAI | IEEE Transactions on Control Systems Technology | 9 | 5 | |
2009 | Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Lithography Asia 2009 | | | |
2015 | Determining Proximity Effect Parameters for Non-Rectangular Semiconductor Structures | Kuen-Yu Tsai; Meng-Fu You; Yi-Chang Lu; KUEN-YU TSAI | | | | |
2012 | Direct-scatterometry-enabled lithography model calibration | Chen, C.-Y.; Tsai, K.-Y.; Shen, Y.-T.; Lee, Y.-M.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 3 | 0 | |
2013 | Direct-scatterometry-enabled optical-proximity-correction-model calibration | Chen, C.-Y.; Ng, P.C.W.; Liu, C.-H.; Shen, Y.-T.; Tsai, K.-Y.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 1 | 0 | |
2014 | Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts | Yang, Y.-Y.; Lee, H.-P.; Liu, C.-H.; Yu, H.-Y.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 0 | 0 | |
2004 | DQIT: μ-synthesis without D-scale fitting | Kuen-Yu Tsai*; Haitham A. Hindi; KUEN-YU TSAI | IEEE Transactions on Automatic Control | 1 | 0 | |
2009 | Effects of Fresnel zone plate fabrication errors on focusing performances | Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | | | |
2021 | Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects | Cai J.-S; Chien S.-W; Zheng X.-Y; Lee C.-L; Tsai K.-Y.; KUEN-YU TSAI | Journal of Micro/Nanopatterning, Materials and Metrology | 0 | 0 | |
2010 | Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method | Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 3 | |
2013 | Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法) | Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu; Kuen-Yu Tsai; KUEN-YU TSAI | | | | |
2014 | Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統) | Jia-Yush Yen; Kuen-Yu Tsai; Lien-Sheng Chen; Pablo Chiu; Hsin-Fan Tsai; KUEN-YU TSAI | | | | |
2012 | Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples | Yu-Tian Shen; Liu, C.-H.; Chen, C.-Y.; Ng, H.-T.; Tsai, K.-Y.; Wang, F.-M.; Kuan, C.-H.; Lee, Y.-M.; Cheng, H.-H.; Li, J.-H.; KUEN-YU TSAI ; CHIEH-HSIUNG KUAN ; JIA-HAN LI | Advanced Lithography - Proceeding of SPIE | 3 | 0 | |
2014 | The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions | Pei, T.-H.; Tsai, K.-Y.; JIA-HAN LI ; KUEN-YU TSAI | Advanced Materials Research | 0 | 0 | |
2011 | Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects | Ng, Philip C.W.; Tsai, Kuen-Yu ; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han ; JIA-HAN LI | Journal of Micro/Nanolithography MEMS and MOEMS | 2 | 0 | |
2011 | Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004)) | Ng P.C.W; KUEN-YU TSAI ; Lee Y.-M; Wang F.-M; JIA-HAN LI ; Chen A.C. | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 0 | |