公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2017 | Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness | Pulikanti Guruprasad Reddy; Neha Thakur; Chien-Lin Lee; Sheng-Wei Chien; Chullikkattil P. Pradeep; Subrata Ghosh; KUEN-YU TSAI ; Kenneth E. Gonsalves | AIP Advances | 13 | 11 | |
2009 | High resolution electron beam direct write on ZEP520 at 5 KeV | Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | | | |
2010 | High spatial resolution and large field intensity by a set of two modified zone plates | Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI | Frontiers in Optics (FiO)/Laser Science XXVI (LS) Conference | 0 | 0 | |
2009 | Hybrid servo design for large area nano pattern stitching | Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI ; JIA-YUSH YEN | IEEE/ASME International Conference on Advanced Intelligent Mechatronics | | | |
2006 | Identifications of the PZT Actuated Novel Optical Scanning System | Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | | | |
2010 | Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography | Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | | | |
2011 | Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography | Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU ; KUEN-YU TSAI ; Li, Jia-Han | Japanese Journal of Applied Physics | 2 | 3 | |
2007 | Impacts of optical proximity correction settings on electrical performances | Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU ; KUEN-YU TSAI | Advanced Lithography 2007 - Proc. SPIE | 6 | 0 | |
2013 | Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography | Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science & Technology B | 8 | 7 | |
2010 | Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography | Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
2023 | The Implement of a Reconfigurable Intelligence Trust Chain Platform with Anti-counterfeit Traceable Version Function for the Customized System-Module-IC | Chen, Hsing Chung; Liang, Yao Hsien; Su, Jhih Sheng; KUEN-YU TSAI ; Song, Yu Lin; Hsu, Pei Yu; Cai, Jia Syun | Lecture Notes on Data Engineering and Communications Technologies | 0 | 0 | |
2014 | Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly | Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2014 - Proc. SPIE | 1 | 0 | |
2011 | In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography | CHIEH-HSIUNG KUAN ; Tsai, Kuen-Yu ; YUNG-YAW CHEN ; JIA-YUSH YEN | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | | 4 | |
2005 | In-situ fault detection of wafer warpage in lithography | Arthur Tay; Weng Khuen Ho; Christopher Yap; Chen Wei; KUEN-YU TSAI | IFAC Proceedings Volumes (IFAC-PapersOnline) | 2 | 0 | |
2021 | Investigation on helium ion beam lithography with proximity effect correction | Lee C.-L; Chien S.-W; Tsai K.-Y; Liu C.-H.; KUEN-YU TSAI | Journal of Micro/Nanopatterning, Materials and Metrology | 1 | 1 | |
2019 | Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning | Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI | Proceeding of SPIE, Optical Microlithography XXXII | 1 | 0 | |
2010 | Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system | Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | | | |
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science and Technology B | 1 | 5 | |
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | The 55th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication | 1 | 5 | |
2009 | Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | | | |