公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2012 | New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints | Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 5 | |
2012 | New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 8 | |
2011 | Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 5 | 5 | |
2011 | Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (vol 10, 033010, 2011) | Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.; KUEN-YU TSAI | Journal of Micro-Nanolithography Mems and Moems | 0 | 0 | |
2005 | On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet | Kuen-Yu Tsai; Eric M. Gullikson; Patrick Kearney; Alan R. Stivers; KUEN-YU TSAI | 25th Annual BACUS Symposium on Photomask Technology -- Proc. of SPIE | 3 | 0 | |
2011 | Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images | Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference | | | |
2014 | Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises | Lee, Y.-M.; Li, J.-H.; Wang, F.-M.; Cheng, H.-H.; Shen, Y.-T.; Tsai, K.-Y.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Optics (United Kingdom) | 0 | 0 | |
2019 | Precision fabrication of EUVL programmed defects with helium ion beam lithography | Lee, C.-L.; Cai, J.-S.; Chien, S.-W.; Tsai, K.-Y.; KUEN-YU TSAI | Proceedings of SPIE - The International Society for Optical Engineering | 2 | 0 | |
2021 | Precision fabrication of EUVL programmed defects with helium ion beam patterning | Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI ; KUEN-YU TSAI | J. of Micro/Nanopatterning, Materials, and Metrology | 1 | 1 | |
2009 | Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography | CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN ; KUEN-YU TSAI ; JIA-YUSH YEN ; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2016 | Process for Fabricating Integrated Circuit (積體電路的製程) | Kuen-Yu Tsai*; Min-Jang Chen; Samuel C. Pan (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | | | | |
2017 | Projection Patterning With Exposure Mask | Kuen-Yu Tsai*; Miin-Jang Chen; Si-Chen Lee (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | | | | |
0 | Projection Patterning With Exposure Mask | Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI | | | | |
2007 | Real-time spatial control of photoresist development rate | Arthur Tay; Weng-Khuen Ho; Ni Hu; Choon-Meng Kiew; Kuen-Yu Tsai; KUEN-YU TSAI | Proc. SPIE , Metrology, Inspection, and Process Control for Microlithography | 0 | 0 | |
2006 | Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography | Arthur Tay; Weng-Khuen Ho; Ni Hu; Kuen-Yu Tsai; Ying Zhou; KUEN-YU TSAI | Proc. SPIE, Data Analysis and Modeling for Process Control II | 0 | 0 | |
2014 | Refractive index and effective thickness measurement system for the RGB color filter coatings with absorption and scattering properties | Lee, Y.-M.; Cheng, H.-H.; Li, J.-H.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | IEEE/OSA Journal of Display Technology | 2 | 1 | |
2009 | Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2009 | | | |
1999 | Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems | Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI | The 25th Annual Conference of the IEEE Industrial Electronics Society, 1999. IECON '99 | 22 | 0 | |
1997 | Servo System Design of a High-Resolution Piezo-Driven Three Degree-of-Freedom Fine Stage for Integrated-Circuit Wafer Step-and-Repeat Lithography Systems | KUEN-YU TSAI | | | | |
2011 | Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system | Kuo, Y.-H.; Wu, C.-J.; Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; KUEN-YU TSAI ; YUNG-YAW CHEN ; JIA-YUSH YEN | Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 5 | 4 | |