公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2009 | Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher | Wang, D.-S.; Chao, J.-J.; CHING-FUH LIN | CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference | |||
2009 | Use of SiO<inf>2</inf> nanoparticles as etch mask to generate large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher | Wang, D.-S.; Chao, J.-J.; CHING-FUH LIN | Optics InfoBase Conference Papers |