公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2018 | Model-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | Advanced Lithography 2018 -- Proc. SPIE 10584 Novel Patterning Technologies 2018 | 5 | 0 | |
2021 | Precision fabrication of EUVL programmed defects with helium ion beam patterning | Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI ; KUEN-YU TSAI | J. of Micro/Nanopatterning, Materials, and Metrology | 1 | 1 | |
2018 | Simulation-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & applications (IWNEBD) |