公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2014 | Overlay-Aware detailed routing for self-Aligned double patterning lithography using the cut process | Liu, I.-J.; Fang, S.-Y.; YAO-WEN CHANG | Design Automation Conference | | | |
2016 | Provably good max-min-m-neighbor-TSP-based subfield scheduling for electron-beam photomask fabrication | Lin, Z.-W.; Fang, S.-Y.; Chang, Y.-W. ; Rao, W.-C.; CHIEH-HSIUNG KUAN ; YAO-WEN CHANG | 2015 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2015 | 1 | 0 | |
2010 | Redundant-wires-aware ECO timing and mask cost optimization | Fang, S.-Y.; Chien, T.-F.; YAO-WEN CHANG | IEEE/ACM International Conference on Computer-Aided Design | | | |
2012 | Simultaneous flare level and flare variation minimization with dummification in EUVL | Fang, S.-Y.; YAO-WEN CHANG | Design Automation Conference | | | |
2013 | Stitch-aware routing for multiple e-beam lithography | Fang, S.-Y.; Liu, I.-J.; YAO-WEN CHANG | Design Automation Conference | | | |
2015 | Stitch-aware routing for multiple e-beam lithography | Liu, I.-J.; Fang, S.-Y.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | | | |