Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2001 | The characteristic behavior of TMAH water solution for anisotropic etching on both silicon substrate and SiO 2 layer | Chen, P.-H.; Peng, H.-Y.; Hsieh, C.-M.; Chyu, M.K.; PING-HEI CHEN | Sensors and Actuators, A: Physical |