公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2009 | High resolution electron beam direct write on ZEP520 at 5 KeV | Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | |||
2010 | High spatial resolution and large field intensity by a set of two modified zone plates | Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI | Frontiers in Optics (FiO)/Laser Science XXVI (LS) Conference | 0 | 0 | |
2010 | High spatial resolution and large field intensity by a set of two modified zone plates | Zhan-Yu Liu; Yao-Jen Tsai; JIA-HAN LI ; Kuen-Yu Tsai | Frontiers in Optics (FiO 2010) | |||
2006 | Identifications of the PZT Actuated Novel Optical Scanning System | Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | |||
2010 | Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography | Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | |||
2007 | Impacts of optical proximity correction settings on electrical performances | Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU ; KUEN-YU TSAI | Advanced Lithography 2007 - Proc. SPIE | 6 | 0 | |
2013 | Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography | Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science & Technology B | 8 | 7 | |
2010 | Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography | Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | |||
2014 | Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly | Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2014 - Proc. SPIE | 1 | 0 | |
2010 | Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system | Yen-Min Lee; JIA-HAN LI ; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony Wen-Hann Sheu; Jia-Yush Yen | 23rd International Microprocesses and Nanotechnology Conference (MNC 2010) | |||
2010 | Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system | Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | |||
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science and Technology B | 1 | 5 | |
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | The 55th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication | 1 | 5 | |
2009 | Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | |||
2010 | Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | Japanese Journal of Applied Physics | 3 | 7 | |
2013 | Method and Apparatus for Designing Patterning System Based on Patterning Fidelity | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | ||||
2014 | Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | ||||
0 | Method and Computer-Aided Design System Of Manufacturing An Optical System | Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI | ||||
2016 | Method and System for Establishing Parametric Model | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI | ||||
0 | Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI |