公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science and Technology B | 1 | 5 | |
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | The 55th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication | 1 | 5 | |
2009 | Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | |||
2010 | Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI | Japanese Journal of Applied Physics | 3 | 7 | |
2013 | Method and Apparatus for Designing Patterning System Based on Patterning Fidelity | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | ||||
2014 | Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) | Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI | ||||
0 | Method and Computer-Aided Design System Of Manufacturing An Optical System | Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI | ||||
2016 | Method and System for Establishing Parametric Model | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI | ||||
0 | Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI | ||||
0 | Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same | Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI | ||||
2014 | Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統) | Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI | ||||
0 | Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.) | Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI | ||||
2013 | Method for Compensating Effect of Patterning Process and Apparatus Thereof | Kuen-Yu Tsai; Chooi-Wan Ng; Yi-Sheng Su; KUEN-YU TSAI | ||||
2014 | Method for Compensating Proximity Effect of Particle Beam Lithography Process (粒子束微影程序鄰近效應之補償方法) | Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI | ||||
2013 | Method for Compensating Proximity Effects of Particle Beam Lithography Processes | Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI | ||||
2004 | Method for Design of Multi-objective Robust Controllers | Kuen-Yu Tsai; Haitham A. Hindi; KUEN-YU TSAI | ||||
2013 | Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects | Kuen-Yu Tsai; Wei-Jhih Hsieh; Bo-Sen Chang; KUEN-YU TSAI | ||||
0 | Method For Non-Resist Nanolithography | Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI | ||||
2010 | Model-based proximity effect correction for electron-beam direct-write lithography | Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng; Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II | 7 | 0 | |
2005 | Modeling the defect inspection sensitivity of a confocal microscope | Eric M. Gullikson; Edita Tejnil; Kuen-Yu Tsai; Alan R. Stivers; H. Kusunose; KUEN-YU TSAI | Microlithography 2005 - Proc. SPIE Vol. 5751, Emerging Lithographic Technologies IX | 16 | 0 |