Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2003 | Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents | Lai, Ying-Hui; Chen, Yao-Lun; Chi, Yun; Liu, Chao-Shiuan; Carty, Arthur J.; Peng, Shie-Ming; Lee, Gene-Hsiang; SHIE-MING PENG | Journal of Materials Chemistry | 41 | 40 |