Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2002 | Reduction substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography | HSUEN-LI CHEN ; Shih M.-C; Hsieh C.-F; Chen B.-C; Ko F.-H. | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 0 | 0 |