Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2001 | Sub-micron gate by optical lithography using photoresist re-flow and spin-on-glass | W.-S. Lour; M.-K. Tsai; K.-C. Chen; Y.-W. Wu; S.-W. Tan; Y. J. Yang; YING-JAY YANG | ECS, State-of-the-art Program on Compound Semiconductors XXXV |